The following papers are included in this publication. 

Physics of Silver Halide Materials

Sanford H. Ehrlich
Eastman Kodak Company

• Silver Molecules and Photographic Sensitivity
  J.W. Mitchell; Department of Physics, University of Virginia, Charlottesville, Virginia pages 1-5.
• The Action of Size-Selected Small Silver Clusters as Latent Image Specks and Development Centers
  F. Granzer, V. Bonacic-Koutecky*, T. Leisner#, C. Rosche, and L. Woste#; Inst. Angewandte Physik, Universitat Frankfurt am Main 
  *Inst. Phys. u. Theor. Chemie, Humboldt-Universitat, Berlin 
  #Inst. Exp. Physik, Freie Universitat, Berlin pages 6-7.
• Influence of Grain Structures on the Photoelectron Lifetime
  Th. Müssig and A. Russow*; Du Pont de Nemours, Deutschland, GmbH, Neu Isenburg, Germany 
  *Technische Hochschule Darmstadt, Germany pages 8-11.
• The Influence of Surface Adsorption on the Decay Kinetics of Photo-e.m.f. Signals from AgBr-Emulsion Crystals
  J. Harenburg, F. W. Müller, J. Siegel*, G. Israel; FB Chemie, MartinLuther-Universität, Halle-Wittenberg, Germany 
  *Agfa-Gevaert AG, Leverkusen, Germany pages 12-14.
• Using a Wave Model to Study Light Propagation in Emulsion Layers Containing Realistically Shaped AgX Grains
  U. Siemen and D. Hertel; Institute of Applied Photophysics, Technical University Dresden, Germany pages 15-18.
• Optical Switching and Limiting: New Applications for Silver Halide Technology?
  M. R. V. Sahyun, Susan E. Hill*, N. Serpone**, Reza Danesh** and Devendra K. Sharma**; Department of Chemistry, University of Wisconsin, Eau Claire, Wisconsin 
  *Imation Corp., St. Paul, Minnesota 
  **Centre for Fast Laser Spectroscopy, Concordia University, Montréal, Canadapages 19-20.
• Application of the Uncertainty Principle to Electron Exposures in Silver Halides and its Implications for Attempts to Use Development Chemistry to Modify Granularity
  V. V. Gokhale; Acton, MA pages 21-22.
• Is the Catalytic Active Silver Surface Really Growing in the Course of Development?
  Vitaliy V. Gavrik; S. I. Vavilov State Optics Institute, St. Petersburg, Russiapages 23-29.

Photothermal and Thermal Silver Halide Systems

Stanley C. Busman
Imation

• Generalization of the Klosterboer-Rutledge Model
  Steven H. Kong; Imation Corporation, Oakdale, Minnesota pages 30-33.
• Silver Formation, Particle Size Distribution, and Morphology in Photothermographic Systems
  Mark B. Mizen; Dry Media Systems Laboratory, Imation Corp., St. Paul, Minnesota pages 34-37.
• Silver Halide/Silver Carboxylate Photothermographic Imaging Systems: Characteristic Properties of Structure and Development
  B. B. Bokhonov, L. P. Burleva, A. A. Politov, N. F. Uvarov, D. R. Whitcomb*, M. B. Mizen* M. R. V. Sahyun**; Institute of Solid State Chemistry, Novosibirsk, Russia 
  *Imation Corporation, St. Paul, Minnesota 
  **University of Wisconsin, Eau Claire, Wisconsin pages 38-41.
• Peculiarities in the Kinetics of Thermally Developed, "Dry Silver" Type Photographic Materials
  Yu. E. Usanov, T. B. Kolesova, L. P. Burleva*, M. R. V. Sahyun**, D. R. Whitcomb#; S. I. Vavilov State Optical Institute, St. Petersburg, Russia 
  *Institute of Solid State Chemistry, Novosibirsk, Russia 
  **University of Wisconsin, Eau Claire, Wisconsin 
  #Imation Corporation, St. Paul, Minnesota pages 42-45.

Silver Halide Poster Session

• The Peculiarities of an Electrolytic Reduction of Emulsion Grains
  Valery Zakharov; Department of Chemistry, Moscow State University, Russiapages 46-48.
• Permanence of Size Distribution of Silver Nanoclusters Produced in Silver Halide by Light or Chemical Fogging and Partly Oxidized with Photolytic Halogen
  Vitaliy V. Gavrik and Olga N. Kononova; S. I. Vavilov State Optics Institute, St.. Petersburg, Russia pages 49-51.
• Nonselective Reduction of Agbr Emulsion. Correlation Between Concentration of Silver on the Surface and Microcrystals Speed
  Anatoly Galashin, Andrey Rumiantcev, and Valery Zakharov; Department of Chemistry, Moscow State University, Russia pages 52-55.

Physics of Silver Halide Materials

Sanford H. Ehrlich
Eastman Kodak Company

• Vibrational Mechanism of the Latent Image Speck Formation
  Leonid Aslanov, Aleksandr Karabutov*, Natalia Podymova*, Henk Schenk** and Valery Zakharov; Department of Chemistry, Moscow State University, Russia 
  *Laser Center, Moscow State University, Russia 
  **Department of Chemistry, University of Amsterdam, The Netherlands pages 56-57.

Silver Halide Poster Session

• Model of Subsurface Area in Silver Halides
  V. V. Svistunova and T. Yu. Frenkel; Kemerovo State University, Kemerovo, Russia pages 58-58.
• Surface Analysis of Silver Halide Microcrystals by Imaging Time-of-Flight SIMS (TOF-SIMS)
  G. Verlinden, R. Gijbels, O. Brox*, A. Benninghoven*, I. Geuens**, and R. De Keyzer**; University of Antwerp-UIA), Department of Chemistry, Antwerp, Belgium 
  *Physikalisches Institut der Universität, Münster, Germany 
  **Agfa-Gevaert N.V., R&D Laboratories, Mortsel, Belgium pages 59-61.

Models of Silver Halide Processes: Metal and Semiconductor Clusters, Heterogeneous Photocatalysis Semiconductor Clusters

German Mills
Auburn University

• From Gas Phase Clusters to Nanoparticles: A Route to Novel Materials
  M. Samy El-Shall; Department of Chemistry, Virginia Commonwealth University, Richmond, Virginia pages 62-62.
• Identification and Characterization of Polyselenides and their Radical Ions
  A. J. Goldbach, J. A. Johnson, M. L. Saboungi, L. A. Curtiss*, A. R. Cook** and D. Meisel**; Material Sciences, Argonne National Laboratory, Argonne, Illinois 
  *Chemical Technology, Argonne National Laboratory, Argonne, Illinois 
  **Chemistry Divisions, Argonne National Laboratory, Argonne, Illinois pages 63-63.

Silver and Silver Halide Systems

• Preparation and Quantum Size Effect of Nanometer-sized AgBr/I Photographic Emulsion
  Suwen Liu, Jun Yue, Shengli Fu, Tanhong Cai and Maosen Chang; Department of Chemical Physics, University of Science & Technology of China, Hefei, Anhui, P. R. China pages 64-66.
• Redox Reactivity of Silver Clusters at the Surface of AgCl Crystallites in Aqueous Solutions
  J. L. Marignier, M. Ashokkumar* and M. Mostafavi; Laboratorie de Physico-Chimie des Rayonnements, CNRS, Orsay, France 
  *Advanced Mineral Products Research Centre, University of Melbourne, Parkville, Australia pages 67-72.
• Fabrication and SERS Study of Single Silver Nanoparticles
  Tong Xiao, Qi Ye and Li Sun; Department of Chemistry, University of Minnesota, Minneapolis, Minnesota pages 73-78.
• Empirical Two- and Three-particle Potentials in Application to the Structure of Ag Microclusters on the Surface
  Igor K. Kudryavtsev, Leonid A. Aslanov, and Sergey G. Zhukov; Chemical Department, Moscow State University, Moscow, Russia pages 79-83.

Metal Clusters

• Development Kinetics of Bimetal Clusters in Solution
  Jacqueline Belloni, Mehran Mostafavi, Jamal Khatouri and Chantal de Cointet; Laboratoire de Physico-Chimie des Rayonnements, Universite Paris-Sud, Orsay, France pages 84-87.

Photochemistry

• Primary Events in the Photocatalytic Deposition of Silver on Nanoparticulate TiO₂
  M. R. V. Sahyun and N. Serpone*; Department of Chemistry, University of Wisconsin, Eau Claire, Wisconson *
  Department of Chemistry and Biochemistry, Concordia University, Montreal, Quebec, Canada pages 88-88.

AgX Chemical Sensitization

Annabel A. Muenter and Jorg Siegel*
Eastman Kodak Company; *Agfa-Gevaert AG

• Comprehensive Model for Sulfur Sensitization
  Tadaaki Tani; Ashigara Research Laboratories, Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa, Japan pages 89-92.
• Effect of Gold + Sulfur Sensitization on the Delayed Formation of Latent Image Specks in a Vacuum
  Ken’ichi Kuge, Yang Yin and Nobuo Mii; Faculty of Engineering, Chiba University, Chiba, Japan pages 93-95.
• Investigations on Mechanism of Adsorption of Complexing Agents at Silver Halide Crystal Surfaces
  Yv. Goerlitz*,**, J. Siegel* and G. Israel**; *Agfa Gevaert AG, Leverkusen, Germany 
  **Institut für Organische Chemie, Universität Halle, Germany pages 96-99.
• Energy and Charge Delocalization in J-Aggregates: Model Experiments in Monolayer Systems
  Dietmar Möbius; Max-Planck-Institut für biophysikalische Chemie, Göttingenpages 100-101.
• Structural Characterization of 2-D Cyanine Dye Aggregates on Model AgX Surfaces by Combined Physical and Chemical Methods
  Mitsuo Kawasaki; Division of Molecular Engineering, Kyoto University, Yoshida, Kyoto, Japan pages 102-105.
• Incoherent Energy Migration In Optically Active J-Aggregates
  S. Daehne, U. De Rossi, S. Kirstein*, A. Pawlik*, and C. Spitz; Federal Institute for Materials Research and Testing, Berlin, Germany 
  *Max Planck Institute for Colloids and Surfaces, Berlin, Germany pages 106-110.
• Liquid-Crystalline J-Aggregates Formed by Aqueous Ionic Cyanine Dyes
  Bill Harrison; Kodak European R&D, Harrow, United Kingdom pages 111-116.
• New Aspects of the High and Low Interstitial Concentration Desensitization of Silver Halide Emulsions
  J. Siegel; Agfa-Gevaert AG, Leverkusen, Germany pages 117-120.
• Linewidth Behavior of the ESR Signal of Dye Radicals on Spectrally Sensitized AgX Microcrystals
  T. Ceulemans, D. Schoemaker, D. Vandenbroucke*, R. De Keyzer*; University of Antwerp-U.I.A., Department of Pysics, Antwerpen, Belgium *
  Agfa-Gevaert N.V., R&D Laboratories, Mortsel, Belgium pages 121-124.
• Luminescence of Silver Halide Microcrystals with Adsorbed Dye and Mechanism of Spectral Sensitization
  Vitaliy M. Belous, Alexander Yu. Akhmerov, Sergey A. Zhukov, Nina A. Orlovskaya; Scientific Research Institute of Physics, Odessa, Ukraine pages 125-132.
• The Effects of Aggregation on the Redox Levels of Cyanine Dyes
  J. R. Lenhard and B. R. Hein; Eastman Kodak Company, Rochester, New Yorkpages 133-136.
• Time Scales for Electron Transfer Reactions of J-Aggregates at AgBr Surfaces
  M.T. Spitler and F. Willig*; Boston University, Boston, Massachusetts 
  *Fritz Haber Institute, Berlin, Germany pages 137-138.
• Island and Oriented Growth of Merocyanine Dye on AgBr Single Crystal Films
  Katsutoshi Tanabe, Hiroshi Saijo* and Makoto Shiojiri*; Ehime University, Matsuyama, Japan 
  *Kyoto Institute of Technology, Kyoto, Japan pages 139-144.

Silver Halide Poster Session (2)

• Iron in Photographic Gelatin—I.The Influence of Fe²⁺ Ions in Gelatin Medium on Chemical Sensitization of Silver Halide
  Huang Bixa, Zhou Tao*, Chang Li*, Yin Yimei and Yue Jun*; Department of Applied Chemistry, University of Science and Technology of China 
  *Department of Chemical Physics, University of Science and Technology of China pages 145-147.
• Iron in Photographic Gelatin—II Effective Elimination of Iron Impurity in Gelatin
  Yimei Yin, Bixia Huang, Cao Xinde, Sue Jon, Wang Tie*; Dept. of Appl. Chem., University of Science and Technology of China 
  *Bao Tog Gelatin Factory (China) pages 148-149.
• Influence of Redox Buffer Solutions on Photographic Sensitivity
  Yu.V. Fedorov and V.N. Zakharov*; N.N. Semenov Institute of Chemical Physics, Moscow, Russia 
  *M.V. Lomonosov Moscow State University, Department of Chemistry, Moscow, Russia pages 150-151.
• Stability and Developability of Silver and Gold Latent-Image Centres
  Yuri V. Fedorov, Valery N. Zakharov*; N. N. Semenov Institute of Chemical Physics, Moscow, Russia 
  *M. V. Lomonosov Moscow State University, Chemical Department, Moscow, Russia pages 152-153.
• Three Stages in Formation of Silver Halide T-crystals, Created by a Method of a Physical Ripening of Fine Emulsions
  Timothy A. Larichev and Eugenie I. Kagakin; State University of Kemerovo, Kemerovo, Russia pages 154-157.
• Non-uniformity of Halide Ions Distribution in AgBr(I) T-crystals, Created by a Method of a Physical Ripening of Fine Emulsions
  Timothy A. Larichev and Eugenie I. Kagakin; State University of Kemerovo, Kemerovo, Russia pages 158-159.
• Influence of Fine Emulsion Properties to the Sensitometric Characteristics of T-Crystals, Received in Result of a Physical Ripening of this Emulsion
  Timothy A. Larichev; State University of Kemerovo, Kemerovo, Russia pages 160-162.
• An Effect of a Desensitization by the Shell Precipitation on Chemically Sensitized AgHal Core Microcrystals
  Boris A. Sechkarev, Larisa V. Sotnikova, Timothy A. Larichev, Marina I. Ryabova and Vasily N. Gusev; State University of Kemerovo, Kemerovo, Russia pages 163-164.
• A Procedure of the Chemical Sensitization Rate Checking of AgCl Emulsion Microcrystals
  Boris A. Sechkarev and Marina I. Ryabova; State University of Kemerovo, Russia pages 165-166.
• Crystallization of AgCl Shell on Bromoiodide Emulsion Microcrystals
  Larisa V. Sotnikova, Timothy A. Larichev, Vladimir M. Fomchenko and Boris A. Sechkarev; State University of Kemerovo, Kemerovo, Russia pages 167-168.
• Evolution of Silver Sulfide Centers on AgBr Microcrystals Surface during Chemical Sensitization
  Eugenie I. Kagakin, Vadim G. Dodonov, Anna V. Petrushina, Valery M. Pugachov and Sergey V. Pashkovsky; State University of Kemerovo, Kemerovo, Russia pages 169-171.
• Dithiocarbaminates Are the Prospective Reagents for Metal Cations
  Myroslav M. Orlynski and Christina M. Orlynska; Lviv Medical Institute, Department of Organic and Bioorganic Chemistry, Lviv, Ukraine pages 172-175.
• Participation of Gelatin Aminogroups In Silver Halide Emulsions Sensitization with Organothio Compounds
  P.M. Zavlin, L.L. Kuznetsov, Yu. V. Beilin and A.N. Diakonov; St. Petersburg Institute of Cinema and Television, St. Petersburg, Russia pages 176-177.
• AgHal Crystals Growth Modification and Stabilization by the Amides of Phosphoric Acid
  Pavel M. Zavlin and Dmitry A. Efremov; St. Petersburg Institute of Cinema and Television, St. Petersburg, Russia pages 178-180.
• Study of Toning Processes for Photographic Paper
  S. Chernov*, R. Heron**, S. Rifkin# and V. Zakharov##; *Research Center of Molecular Diagnostics, Moscow, Russia 
  **Indiana University, Bloomington, Indiana 
  #Minneapolis, Minnesota 
  ##M.V.Lomonosov Moscow State University, Moscow, Russia pages 181-184.
• Distribution Feature of Calcium with Respect to Molecular Weight in Calcium-Containing Photographic Gelatin
  Huang Bixia, Xu Loo, Yin Yimei, Sue Jun, Zhang Weixiang; Dept. of Applied Chemistry, University of Sci. & Tech. of China, Hefei, Anhui, China pages 185-187.

Preparation and Structure of Silver Halide Emulsion Grains

Ingo Leubner
Eastman Kodak Company

• Improved Imaging SIMS Applied to Banded AgBr/AgBr_1-xI_x Tabular Grains
  J.M. Chabala, J. Bohonek*, R. Levi-Setti and A.N. Kriebel*; The University of Chicago, Enrico Fermi Institute and Department of Physics, Chicago, Illinois 
  *ILFORD AG, Fribourg, Rue de l’industrie, Switzerland pages 188-190.
• Radiochemical Investigations of Ion Exchange on Silver Halide Crystals
  Achim Winzer and Dirk Rohde; Martin-Luther-Universität Halle-Wittenberg, Merseburg, Germany pages 191-194.
• A New Crystal Nucleation Theory for Continuous Precipitation
  Ingo H. Leubner; Imaging Research and Advanced Development, Eastman Kodak Company, Rochester, New York pages 195-195.

Photographic Imaging Chemistry and Development

Jon Staples
Eastman Kodak Company

• The Synthesis, QSAR, and Molecular Modeling of Pyrazolone Magenta Couplers
  Barbara B. Lussier; Eastman Kodak Company, Rochester, New York pages 196-200.
• Imidazolium Hardeners
  L. Fodor; Sterling Diagnostic Imaging. Inc., Brevard, North Carolina pages 201-205.
• New Interlayer Scavenger Technology
  John W. Harder, Ronald E. Leone, Stephen P. Singer and Janet N. Younathan; Imaging Research and Advanced Development, Eastman Kodak Company, Rochester, New York pages 206-209.
• Mechanism of the Interimage-Effect in Color Reversal System and Its Application to Improve Color Reproduction
  Sadanobu Shuto, Shigeru Kuwashima, Shinsuke Bando and Shunji Takada; Ashigara Research Laboratories, Fuji Photo Film Co., Ltd., Nakanuma, Minami-Ashigara, Kanagawa, Japan pages 210-212.
• Examination of the Mechanism of Base Hydrolyses of N-(p-Nitrophenoxymethyl)-Substituted Imides
  Eric J. Ginsburg, J. Ramon Vargas and Xiqiang Yang; Imaging Research and Advanced Development, Eastman Kodak Company, Rochester, New Yorkpages 213-216.
• Development of a Novel Ketene-Forming Switch
  Louis E. Friedrich, John E. Kaufman, and Jon A. Kapecki; Eastman Kodak Company, Rochester, New York pages 217-217.
• Factors Limiting the Developing Speed of Color Paper
  Yoshihiko Suda; Photographic Materials Development Division, Konica Corporation, Tokyo, Japan pages 218-220.
• Mechanism of Development in Nanometer-sized Silver Halide Emulsion
  Suwen Liu, Jun Yue, Tanghong Cai and Maosen Chang; Department of Chemical Physics, University of Science & Technology of China, Hefei, Anhui, China pages 221-222.

Silver and Silicon

Michael A. Kriss

• AgX Image Capture
  Tadaaki Tani; Ashigara Research Laboratories, FujiPhoto Film Co., Ltd., Minami-Ashigara, Kanagawa, Japan pages 223-225.
• A Digital Path to Better Pictures
  James R. Milch; Eastman Kodak Company, Rochester, New York pages 226-229.
• Hybrid Imaging Systems
  Hiromichi Enomoto; Konica Corporation, R&D Center, Tokyo, Japan pages 230-232.
• Instant Imaging
  Stephen Sofen; Polaroid Corporation, Cambridge, Massachusetts pages 233-239.
• Hardcopy Technologies for Digital Photography
  Lawrence R. Hanlon; Hewlett-Packard Labs, Palo Alto, California pages 240-240.

Hybrid Imaging: The Use of Sensitizied Media for Digital Imaging

Richard Landholm
Eastman Kodak Company

• Opportunities for Materials in Hybrid Digital Imaging
  Douglas H. Dybvig; Imation Corp., Oakdale, Minnesota pages 241-241.
• The Efforts of Eastman Kodak Company to Produce a Direct Digital Output Silver Halide Color Paper
  John F. Bacilek; Sensitized Goods Platform Center, Eastman Kodak Company, Rochester, New York pages 242-246.
• Light Sources for Digital AgX Colour Printers
  Roy Ference and John Carson; Eastman Kodak Company, Rochester, New York pages 247-247.
• Compact Color Hard Copy System Using Vacuum Fluorescent Print Head
  Yukihiko Shimizu and Yoichi Kobori; Research & Development Center, Futaba Corporation, Chiba, Japan pages 248-250.
• A New Red-Sensitive Silver Diffusion Transfer Reversal Alumium Printing Plate
  Johan Van hunsel, Paul Coppens, Dave Van den Bergh and Jo Vander Aa; Agfa-Gevaert N.V., Mortsel, Belgium pages 251-256.

Digital Printing Technologies I: Electrostatic Marking

Robert J. Nash and Dan Hays
Xerox Corporation

• Photoreceptors for Digital Imaging
  David S. Weiss; Eastman Kodak Company, Rochester, New York pages 257-257.
• Characteristics of Mixed Crystals of VOPc-TiOPc Used as Near-Infrared Sensitive Photoconductors
  Yan-qiao Wang, Jin-wei Zhou, Su-hua Wang and De-yuan Ren; Institute of Chemistry, Chinese Academy of Sciences, Beijing, China pages 258-261.
• Toner Materials
  Masayuki Maruta; Kao Corporation, Recording & Imaging Science Labs., Wakayama, Japan pages 262-263.
• High-Photosensitive Avalanche-Mode Imaging Materials
  Yu. A. Cherkasov and N. B. Zakharova; E. L. Alexandrova Research Center, Vavilov State Optical Institute, St. Petersburg, Russia pages 264-266.
• Recent Progress in Electrophotographic Digital Color Marking
  Yasuji Fukase; Fuji Xerox Co., Ltd., Kanagawa, Japan pages 267-268.
• Particle Based Simulations of Image Quality Defects
  John G. Shaw, Ted Retzlaff and Palghat S. Ramesh; Xerox Corporation, Webster, New York pages 269-272.
• Wide-Body Printer Trends — Electrography
  Dene H. Taylor; Dunmore Corporation, Newtown, Pennsylvania pages 273-275.
• Electrical Simulation of Liquid Development for Electrography
  I. Chen, J. Mort and M. A. Machonkin; Wilson Center for Research and Technology, Xerox Corporation, Webster, New York pages 276-278.
• Rotor Dynamics of Polygonal Mirror Scanner Motor Supported by Air Bearings in Digital Electrophotography
  Hiroyuki Kawamoto; Foundation Research Laboratory, Corporate Research Laboratories, Fuji Xerox Co., Nakai-machi, Ashigarakami-gun, Kanagawa, Japan pages 279-283.
• A Printer Model for Color Printing
  Huanzhao Zeng, and Bob Chin; Encad, Inc., San Diego, California pages 284-288.

Digital Printing Technologies II: Laser Thermal Printing

William H. Simpson
Eastman Kodak Company

• High Quality Dry Laser Thermal Printing Technology
  Charles DeBoer; Eastman Kodak Company, Rochester, New York pages 289-289.
• Pulse Duration Dependence for Laser Photothermal Imaging Media
  David E. Hare, Dana D. Dlott, Richard J. D’Amato* and Thomas E. Lewis*; University of Illinois at Urbana Champaign, Urbana, Illinois 
  *Presstek, Inc., Hudson, New Hampshire pages 290-295.
• Laser Dye Removal Technology for Digital, Dry Imagesetting Film
  Stephen M. Neumann; Eastman Kodak Company, Rochester, New York pages 296-297.

Digital Printing Technologies III: Resistive Head Thermal Printing

William H. Simpson
Eastman Kodak Company

• Resistive Thermal Printing
  Gary K. Lum; Eastman Kodak Company, Rochester, New York pages 298-298.
• Polymers for Electronic Imaging: The Control of Dye Transport via Dye-Polymer Interactions
  A. A. Clifton, A. T. Slark and A. Butters; ICI Imagedata, Brantham, Manningtree, Essex, England pages 299-304.
• Development of Motion Image Printer
  Hiroshi Akahori, Kenji Iwano, Kouji Ikeda, Yasuo Fukui, Kunio Nobori, Kazuhiro Kayashima; Matsushita Electric Industrial Co., Ltd., Hikaridai, Seika, Soraku, Kyoto, Japan pages 305-308.

Digtial Printing Technologies IV: Ink Jet Printing

Eric G. Hanson
Hewlett Packard

• Review of Piezoelectric Ink Jet Printing
  Hue P. Le; Le Technologies, Inc., Beaverton, Oregon pages 309-309.
• Surface Modification of Black Pigments: A Novel Approach for Advancing Black Pigment Performance In Imaging Systems
  Joseph E. Johnson; Ink Jet Colorants Division, Cabot Corporation, Billerica, MApages 310-312.
• Continuous Ink Jet Technology
  John M. Schneider; Scitex Digital Printing, Inc., Dayton, OH pages 313-318.

Digital Photography Systems I

Jack Holm
Consultant

• Consumer Digital Photography: The Big Picture
  David M. Lewis and Kenneth A. Parulski; Eastman Kodak Company, Rochester, New York pages 319-321.
• Imaging Systems for the Creation of a Large Digital Image Archive
  Sabine Susstrunk; Corbis Corporation, Bellevue, Washington pages 322-325.
• Digital Photography Standards; New Work in the ISO
  Jack Holm; Consultant, Rush, New York pages 326-334.
• Signal-to-Noise Analysis for Digital Photography
  Rodney Shaw; Hewlett-Packard Research Laboratories, Palo Alto, Californiapages 335-338.

Digital Photography Systems II

Shin Ohno
Sony Corporation

• A Digital Camera using a Universal Serial Bus (USB) Interface
  Tom Berarducci, Jay Endsley, and Wayne Prentice; Eastman Kodak Company, Rochester, New York pages 339-343.
• Characterization of Still Images from a Progressive Scan HDTV Camera
  Andrew Juenger, James Toker, Stuart Spitzer, Mitchell Balonon-Rosen, John Bowman; Polaroid Corporation, Cambridge, Masssachusetts pages 344-348.
• Method of Testing Microlenses for Image Sensors
  H. Miller, J. MacLatchy and S. Bencuya; Image Sensor Technology, Polaroid Corporation, Cambridge, Masssachusetts pages 349-353.
• Stability of Color Filters for Image Sensors
  H. Miller and J. MacLatchy; Image Sensor Technology, Polaroid Corporation, Cambridge, Masssachusetts pages 354-358.
• An Imaging System to Analyse the Behaviour of Reciprocating Hydraulic Seals
  R. Bartlett and C. Nwagboso; Liverpool John Moores University, Electrical Engineering, Electronics and Physics, Liverpool, United Kingdom pages 359-363.

Digital Photography Systems III: Characterization and Evaluation

Jack Holm
Consultant

• A New Method of Modeling Photographic Processes in Color Film Materials for Simulation and Electronic Color Reproduction
  Gregor Fischer; Technical Electronics Institute Aachen University of Technology pages 364-364.
• Development of a 3-Color InGaAs FPA Demonstration System
  Jun Li, Takayoshi Fukaya, Walter F. Kosonocky, Gregory H. Olsen*, Marshall J. Cohen* and Michael J. Lange*; New Jersey Institute of Technology, Electronic Imaging Center, University Heights, Newark, New Jersey 
  *Sensors Unlimited, Inc., Princeton, New Jersey pages 365-368.
• Design of Color Filters for Recording Artworks
  Hideaki Haneishi, Takayuki Hasegawa, Norimichi Tsumura and Yoichi Miyake; Department of Information and Computer Sciences, Chiba University, Chiba, Japan pages 369-372.
• Optimum Spectral Transmittance of Color Filters on Single Chip CCD for Electronic Endoscope
  Norimichi Tsumura, Takaya Tanaka, Hideaki Haneishi and Yoichi Miyake; Department of Information and Computer Sciences, Chiba University, Japanpages 373-376.
• Linear Models for Digital Cameras
  Poorvi L. Vora, Joyce E. Farrell, Jerome D. Tietz*, David H. Brainard*; Hewlett-Packard Laboratories, Palo Alto, California 
  *Dept. of Psychology, University of California at Santa Barbara, Palo Alto, California pages 377-382.
• MTF Analysis and its Measurements for Digital Still Camera
  Yukio Okano; Minolta Co., Ltd. Takatsuki Laboratory, Takatsuki, Japan pages 383-387.
• Image Quality of Digital Photography Prints: 1 Color Expression Quality of Thermal Dye Transfer Prints
  Shin Ohno and Toyoko Fujii; ISC Co., Sony Corp., Atsugi, Japan pages 388-390.

Image Processing I: Printing, Halftoning, Image Quality

Reiner Eschbach
Xerox Corporation

• On Filter Techniques for Generating Blue Noise Mask
  Kevin J. Parker, Qing Yu, Meng Yao*; Dept. of Electrical Engineering, University of Rochester, New York 
  *Color Print and Image Division, Tektronix Inc., Wilsonville, Oregon pages 391-395.
• A Noise Evaluation of Digital Halftone Images Based upon a Human Visual Model
  Hiromichi Enomoto and Po-Chieh Hung; Konica Corporation, Tokyo, Japanpages 396-398.
• Multiple Spatial Channel Printing
  Amnon Silverstein; Hewlett Packard Laboratories, Palo Alto, California pages 399-403.
• Measuring MTF of Paper by Sinusoidal Test Pattern Projection
  Shin-ichi Inoue, Norimichi Tsumura* and Yoichi Miyake*; Tokyo Research Laboratories, Mitsubishi Paper Mills Limited 
  *Department of Information and Computer Sciences, Chiba University, Japanpages 404-408.
• Image Quality Tests For Printers
  Yair Kipman; KDY, Inc., Nashua, New Hampshire pages 409-412.

Image Processing Poster Papers

• Local Visual Pyramids for Image Segmentation
  Hubert Konik, Eric Dinet and Bernard Laget; Université Jean Monnet, lnstitut d'Ingénierie de la Vision, Saint-Etienne, Cedex, France pages 413-416.

Image Processing II

Bernd Kolpatzik
Siemens AG

• Multiscale Document Segmentation
  Hui Cheng, Charles A. Bouman, and Jan P. Allebach; School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana pages 417-425.
• A Comparison of the Multiscale Retinex With Other Image Enhancement Techniques
  Zia-ur Rahman, Glenn A. Woodell* and Daniel J. Jobson*; College of William & Mary 
  *NASA Langley Research Center pages 426-431.
• Image Noise Reduction System Using a Wiener Variant Filter in a Pyramid Image Representation
  Ibrahim Hajjahmad, Munib Wober, and Yibing Yang; Polaroid Corporation, Cambridge, Massachusetts pages 432-436.
• Adaptive Image Sampling Based on the Human Visual System
  Frédérique Robert*,**, Eric Dinet**, Bernard Laget**,#; *CPE Lyon - Laboratoire LISA, Cedex, France 
  **Institut d’Ingénierie de la Vision, Cedex, France 
  #ISEM, Maison des Technologies, Toulon, France pages 437-442.
• Conditional Post-Processing of JPEG Compressed Images
  Reiner Eschbach; Webster Research Center, Xerox Corporation, Webster, New York pages 443-445.
• Print Quality Assessment with a Virtual Microdensitometer
  Jim Grice and Jan Allebach; Electronic Imaging Systems Laboratory School of Electrical and Computer Engineering, Purdue University, W. Lafayette, Indianapages 446-453.
• Reconstruction of Natural Spectra from a Color Sensor Using Nonlinear Estimation Methods
  Friedhelm König; Technical Electronics Institute, Aachen University of Technology, Germany pages 454-458.

Coating Technology I: Modeling Coating Flow

E. Thorgerson and Richard Taylor*
Polaroid Corporation; *Rexam Graphics

• Simulation of Transient and Three-Dime Coating Flows Using a Volume-of-Fluid Technique
  C.W. Hirt, J.E. Richardson, and Ken S. Chen*; Flow Science, Inc., Los Alamos, New Mexico, 
  *Sandia National Laboratory, Albuquerque, New Mexico pages 458-463.
• Three Dimensional Simulations of Coating Flows: Methods for Large Free Surface Deformations and Moving Three-Phase Lines
  Richard A. Cairncross, P. Randall Schunk*, Phil A. Sackinger*, and Rekha R. Rao*; University of Delaware, Mechanical Engineering Department, Newark, Delaware 
  *Sandia National Laboratories, Albuquerque, New Mexico pages 464-468.
• Dip Coating Flow Between Double Plates
  J. J. Cai, R. F. Dunham, P. R. Schunk* and R. R. Rao*; Xerox Corporation,Webster, New York 
  *Sandia National Laboratories, Albuquerque, New Mexico pages 469-469.
• Prediction of the Minimum Wet Thickness of Slot Coating at Low Capillary Number
  Ying Becker and Yantse Wang; Polaroid Corporation, Waltham, MA pages 470-474.
• Analysis of Multi-Layer Slot Coating Using NEKTON
  E. W. Grald, S. Subbiah, L.-W. Ho*; Fluent Inc., Lebanon, New Hampshire 
  *Nektonics Inc., Cambridge, Massachusetts pages 475-478.

Coating Technology II: Coating-Coating Process Technology

S. Fuchigami and K. Chen*
3M; *Sandia National Laboratories

• The Importance of Information Technology in the Coating Scale-Up Process
  Edward D. Cohen; E. I. DuPont de Nemours and Co., Central Research & Development, Wilmington, Delaware pages 479-479.
• Design Optimization of a Liquid-Distribution Chamber-Slot Die Using the DAKOTA Toolkit*
  Ken S. Chen and Walter R. Witkowski; Sandia National Laboratories, Albuquerque, New Mexico pages 480-484.
• Study of Inertial Effects in Coating Die Design using Computational Fluid Dynamics
  Daniel R. Gugliotti, Edgar B. Gutoff, Andrew Tangborn*; Dept. of Chemical Engineering, Northeastern University, Boston, Massachusetts 
  *Dept. of Mech., Manuf., and Industrial Eng., Northeastern University pages 485-487.
• Multiplicity of Flows in Coating Dies
  V. V. Gokhale; Acton, Massachusetts pages 488-490.
• Implications for Coating of Static and Dynamic Wetting
  Kenneth J. Ruschak and Terence D. Blake; Eastman Kodak Company, Rochester, New York pages 491-496.
• Optimization of Imaging Processes by Use of Designed Experiments and Quality Loss Functions
  Allan Ames*, Neil Mattucci**, Douglas Hawkins#; *Reading, MA 
  **Polaroid Corporation, Waltham, MA 
  #Department of Applied Statistics, University of Minnesota, St. Paul, MN pages 497-501.

Coating Technology Poster Session

Edward Brandenburg
Polaroid Corporation

• Modeling the Drying Process of Thin Coatings
  Leonid V. Nikolaychik; TNN Technology, Inc., Milwaukee, Wisconsin pages 502-507.
• Humidity Sensitivity of the Media: A Study of Water Vapor Diffusion in Polymer Film
  Daniel Huang and Leroy Vargas; Film Imaging Research Division, Polaroid Corporation, Waltham, MA pages 508-510.
• FTIR Spectroscopy Studies of Photochemical and Thermal Processes on Offset Lithographic Printing Plates
  Afranio Torres-Filho and Mark L. Erdeski; Anitec Printing Plates, Holyoke, MApages 511-517.
• Effects of Temperature on Ultrasonic Velocity of Gelatin Solutions
  Changfei Zhu*, Jinrui Su**,Suwen Liu#, Wei Liu* and Zhengang Zhu**; *Lab. Of Internal Friction & Defects in Solids, Univ. of Science & Technology of China
  **Institute of Solid State Physics, Chinese Academy of Sciences 
  #Chemical Physics, Dept., Univ. of Science and Technology of China, Hefei, PRC pages 518-519.

Coating Technology III: Complex Fluids Technology

E. Gutoff and J. Terwilliger*
Consultant; *Eastman Kodak Co.

• Direct Measurement of the Rheology of Thin Layers of Reagent During Instant Film Development
  Daniel J. Churella and Anna J. Kerns; Polaroid Corporation, Waltham, Massachusetts pages 520-524.
• Flow Instability of Glycerol/Water/Triton-X-100 Thin Liquid Film System
  Gang-Chi Chen, Y. C. Chiew and J. E. Valentini*; Department of Chemical & Biochemical, Engineering, Rutgers University, Piscataway, New Jersey 
  *Sterling Diagnostic Imaging, Brevard, North Carolina pages 525-528.
• Rheological Study of the Interaction Between Functionalized Latex Particles and Anionic Surfactants in Aqueous Gelatin Solutions
  Michael Dreja, Kurt Heine, Bernd Tieke, and Günter Junkers*; Institut für Physikalische Chemie der Universität zu Köln, Germany 
  *Agfa-Gevaert AG, Leverkusen, Germany pages 529-531.
• A Rheological Method for Measuring Skin Formation in a Latex and Application to a Coating Problem
  Daniel J. Churella and Melvin M. Berman; Polaroid Corporation, Waltham, MApages 532-536.
• Non-Covalent Derivatization: Diffusion Control via Molecular Recognition and Self Assembly
  Donna J. Guarrera, Edward Kingsley, Lloyd D. Taylor and John C. Warner*; Polaroid Corporation, Cambridge, Massachusetts 
  *University of Massachusetts, Department of Chemistry, Boston, Massachusetts pages 537-539.

Coating Technology IV: Drying and Curing Technology

M. Stevanovic and C. Lang*
Polaroid Corporation; *Dupont

• Effect of Excess Air Foil Length on Mottle
  Roger K. Yonkoski and Thomas J. Ludemann; Imation Corporation, Oakdale, MN pages 540-542.
• Influence of Drying Temperature Profile on a Multi-Layer Photographic System
  Fariza B. Hasan, Warren J. Dillman, Daniel D. Huang and Chun-Sheng Ko; Film Imaging Research and Development, Polaroid Corporation, Waltham, MApages 543-547.
• Non-deterministic Analysis of A Liquid Polymeric-film Drying Process
  Ken S. Chen and Richard A. Cairncross; Sandia National Laboratories, Albuquerque, New Mexico pages 548-553.
• Modeling Drying During Low-Speed Coating of Porous and Continuous Films
  Richard A. Cairncross; University of Delaware, Mechanical Engineering Department, Newark, Delaware pages 554-558.
• Direct Evaluation Method of UV Curing Process on the Basis of Conductivity Change of Photopolymerization Materials
  Yasusuke Takahashi, Sunao Tada, and Shoutaro Yamada; Department of Electro-Photo-Optics, Tokai University, Hiratsuka, Kanagawa (Japan) pages 559-563.
• Kinetic Study of Free-Radical Polymerization of Multifunctional Acrylates and Methacrylates
  Mei Wen, Li Voon Ng, Jason A. Payne, Lorraine F. Francis, L. E. Scriven and Alon V. McCormick; Department of Chemical Engineering and Materials Science, University of Minnesota, MN pages 564-569.
• Monitoring the Kinetics of UV Curing Using In Situ Rheology and Real-Time Fourier Transform Infrared Spectroscopy
  Bor-Sen Chiou and Saad A. Khan; Dept. of Chemical Engineering, North Carolina State Univ., Raleigh, North Carolina pages 570-574.
• Peel Force and Release Strength Behavior of a Peel Apart Dry Imaging Film
  Philip Y. Z. Chu and R. Kannabiran; Research and Development, Polaroid Corporation, Waltham, MA pages 575-577.

Image Permanence

Peter Roth
Polaroid Corporation

• Moisture Buffering Properties of Photographic Materials
  Mark McCormack-Goodhart; Smithsonian Institution, Washington, D. C. pages 578-578.
• Molecular Sieves for Film Preservation
  A. Tulsi Ram, David F. Kopperl and Paige Miller; Eastman Kodak Company, Rochester, New York pages 579-580.
• Replacement of Mercury Antifoggants for Photothermographic Imaging Materials
  J. Blair, G. LaBelle, F. Manganiello, K. Sakizadeh and D. Whitcomb; Imation Corporation, Oakdale, MN pages 581-583.
• Preserving Original Image Content in High-Resolution Digital Archives
  Mark H. McCormick-Goodhart and Joseph Holmes*; Smithsonian Institution, Washington D.C. 
  *Consultant for the Museum of Modern Art, New York, New York pages 584-587.
• Use of Micro-Environments for the Preservation of Cellulose Triacetate Photographic Film
  Jean-Louis Bigourdan, Peter Z. Adelstein and James M. Reilly; Image Permanence Institute, Rochester Institute of Technology, Rochester, New Yorkpages 588-596.
• Digitization of Photographic Collections
  Franziska Frey; Image Permanence Institute, Rochester Institute of Technology, Rochester, New York pages 597-599.
• The Wet Collodion Process: A Scientific Approach
  Dirk Hertel, Pia Skladnikiewitz and Irene Schmidt; Institute of Applied Photophysics, Technical Univ., Dresden, Germany pages 600-604.

Holography I: Evolution of Holography

Emmeth N. Leith
University of Michigan

• From Lippmann Photography to Selectograms, via White Light Holography
  Yuri N. Denisyuk; Ioffe Physico-Technical Institute of the Academy of Sciences of Russia, St. Petersburg, Russia pages 605-605.
• Holography in Porous Silicon
  G. Lérondel, S. Setzu, M. Thönissen* and R. Romestain; Laboratoire de Spectrometrie Physique, Université J. Fourier, CNRS, Cedex, France 
  *Institute für Schich-und Ionentechnik, ISI, Jülich, Germany pages 606-606.
• Wavelength Multiplexed Holography
  Alois Renn, Bernd Plagemann and Urs P. Wild; Physical Chemistry Laboratory, Swiss Federal Institute of Technology, ETH-Zetrum, Zurich, Switzerland pages 607-607.
• Gain Gratings And Dynamic Holography In Solid-State Laser Media
  A. Brignon and J.P. Huignard; LCR, Thomson - CSF, France pages 608-608.
• Holographic Methods for X-Ray and Electron Crystallography
  D. K. Saldin; Department of Physics, University of Wisconsin-Milwaukee, Milwaukee, Wisconsin pages 609-609.
• Matter-Wave Diffraction at Light Holograms
  Stefan Bernet, Roland Abfalterer, Claudia Keller, Markus K. Oberthaler, Joerg Schmiedmayer and Anton Zeilinger; Institut fuer Experimentalphysik, Universitaet Innsbruck, Innsbruck, Austria pages 610-610.
• Review of Materials for Holographic Optics
  Willis S. Colburn; Kaiser Optical Systems, Inc., Ann Arbor, Michigan pages 611-611.
• Dispersion Characteristics of Reflection Holographic Grating
  V. B. Markov and A. I. Khizhnyak; Institute of Applied Optics, The National Academy of Sciences of Ukraine, Kiev, Ukraine; and Centro Internacional de Fisica, Bogota, Colombia pages 612-612.
• Matching a Phase Material to an Application
  Richard D. Rallison; Ralcon Development Lab., Paradise, Utah pages 613-613.
• Organic Materials for Real-time Holographic Recording
  V. Weiss*,#, A. A. Friesem* and V. A. Krongauz**; *Physics of Complex Systems, The Weizmann Institute of Science 
  **Dept. of Organic Chemistry, The Weizmann Institute of Science 
  #ELOP Electrooptics Industries, Rehovot, Israel pages 614-614.
• Various Dyed Photosensitive Materials for Holography
  Roger A. Lessard; Center for Optics, Photonics and Lasers, Dept. of Physics, Laval University, (Canada) pages 615-615.
• Inorganic Materials for Archival Holographic Recording
  V. Weiss*,#, A. A. Friesem* and A. Peled**; *The Weizmann Institute of Science, Physics of Complex Systems 
  #ELOP Electrooptics Industries, Rehovot, Israel 
  **CTEH - aff. Tel Aviv University, Holon, Israel pages 616-616.

Holography II: Phase Materials in Holography

C. Newswanger
CFC Applied Holographics

• An Overview of the Development of Holography
  E. N. Leith; The University of Michigan, Ann Arbor, Michigan pages 617-617.
• Grating Electromagnetic Theory ‘User Guide’
  M. Neviére and E. Popov*; Laboratoire d’Optique Electromagnétique, Cedex, France 
  *Bulgarian Academy of Sciences - on leave from the Inst. of Solid State Physics pages 618-618.
• Multiple Wavelength Holographic Interferometry
  David C. Weber, Neal J. Brock, James D. Trolinger, and James E. Millerd; MetroLaser, Inc., Irvine, California pages 619-619.

Holography IV: Materials & Reconstruction

J. Trout
DuPont Holographics Materials

• Spatial-Angular Selectivity of 3D Speckle-Wave Holograms and Information Storage
  Vladimir B. Markov; Institute of Applied Optics, The National Academy of Sciences of Ukraine, Kiev, Ukraine; and Centro Internacional de Fisica, Bogota, Colombia pages 620-620.

Holography II: Phase Materials in Holography

C. Newswanger
CFC Applied Holographics

• Mass Replication of Holograms and Diffraction Gratings by Embossing
  Craig Newswanger; CFC Applied Holographics, Oxnard, California pages 621-623.
• Image Processing Technique for the Reproduction of Deep 3-D Images by Holoprinter
  Masahiro Yamaguchi, Takeyuki Ajito, and Nagaaki Ohyama; Tokyo Institute of Technology, Imaging Science and Engineering Laboratory (Japan) pages 624-624.

Holography IV: Materials & Reconstruction

J. Trout
DuPont Holographics Materials

• Very Selective Volume Holograms: Manufacturing and Applications
  Nadya Reinhand, Yuri Korzinin*, Irina Semenova**; Russian Academy of Sciences, Institute of Mechanical Engineering Problems, St. Petersburg, Russia
  *Vavilov State Optical Institute, St. Petersburg, Russia 
  **A. F. Ioffe Physical Technical Institute, Russian Academy of Sciences, St. Petersburg, Russia pages 625-625.
• Holographic Recording Media: State-of-the-Art and Modern Trends
  Valery Barachevsky; Center for Photochemistry of Russian Academy Sciences, Moscow, Russia pages 626-631.

3-D Image Generation and Display

John Merritt and Vivian Walworth*
Interactive Technologies; *Jasper Associates

• Applications of 3-D in Medicine and Dentistry
  Reuben Hoppenstein and David G. Burder; T3—True 3-D Technologies Corporation and 3-D Images, New York and London, England pages 632-632.
• Novel 3D Stereoscopic Technologies from VRex
  Leonard Cardillo, Carl Tung, David Swift, Gerry Lazzaro, Sadeg Faris and John Merritt*; VRex, Inc., Elmsford, New York 
  *Interactive Technologies, Williamsburg, MA pages 633-638.
• Full-color 3-D Prints and Transparencies
  J. J. Scarpetti, P. M. DuBois, R. M. Friedhoff, and V. K. Walworth; The Rowland Institute for Science, Cambridge, MA pages 639-642.
• Point, Shoot, and View — in 3-D
  Samuel Kitrosser; Consultant, Lexington, Massachusetts pages 643-644.
• Stereo Matching by Using MDL Based SSD Method
  Nobuhito Matsushiro and Kazuyo Kurabayashi; First Research Laboratory, OKI Data Corporation, Japan pages 645-647.

Stereolithography: 3-D Fabrication-Materials and Methods

Kevin Dyer; Douglas Neckers*
3D Systems; *Bowling Green State University

• Photoreactive Monomers and Catalysts for Desktop Manufacturing
  D.C. Neckers, B. Fry, A. Guo, A. Lungu, A. Mejiritski, V. Lungu, and T. Marino; Ctr. for Photochemical Sciences, Bowling Green State Univ., Ohio pages 648-648.
• Stereolithography of Ceramics and Metals
  Walter Zimbeck and Roy Rice*; Ceramic Composites, Inc., Annapolis, Maryland 
  *Consultant, Alexandria, Virginia pages 649-655.
• Stereolithography for Rapid Tooling for Injection Molding: The Effect of Cooling Channel Geometry
  M. Janczyk, R. McLaughlin, R. Malloy, and S. McCarthy; Institute for Plastics Innovation, University of Massachusetts Lowell, Massachusetts pages 656-660.

Liquid Crystal Based and Reflective Technologies

Gregory P. Crawford
Brown University

• Optical Array Fabrication via Photoimaging of Acrylate Monomers
  Paul M. Ferm, Kevin Battell, Karl Beeson, Robert Blomquist, Arthur Martin, Macrae Maxfield, Michael McFarland, and Scott Zimmerman; AlliedSignal MicroOptic Devices, Morristown, New Jersey pages 661-665.
• Electro-Optical Switching Characteristics of Holograms Recorded in Polymer Dispersed Liquid Crystals
  L. V. Natarajan*, R. L. Sutherland*, V. P. Tondiglia* T. J. Bunning* and R. M. Neal; Materials Directorate, Wright Laboratory, Wright-Patterson AFB, Ohio 
  *Science Applications International Corporation, Dayton, Ohio pages 666-668.
• Full-Color Reflective Displays
  Emily W. Nelson, Adrian D. Williams, Gregory P. Crawford, Louis D. Silverstein* and Thomas G. Fiske**; Brown University, Providence, Rhode Island 
  *VCD Sciences, Scottsdale, Arizona 
  **dpiX, A Xerox Company, Palo Alto, California pages 669-673.
• Interferometric Modulation: A MEMS Based Technology for the Modulation of Light
  M. W. Miles; Etalon, Inc., Boston, Massachusetts pages 674-677.
• Problems in Measuring the Optical Characteristics of Flat Panel Displays
  George R. Jones; NIST, Gaithersburg, Maryland pages 678-678.

Laser Projection Devices

• Electrically Addressable Lasing Pixel for Large Screen Display
  J.A. Firehammer, S.D. Vartak*, G. P. Crawford, N.M. Lawandy**; Division of Engineering, Brown University, Providence, Rhode Island 
  *Department of Physics, Brown University, Providence, Rhode Island 
  **Spectra Science Corporation, Providence, Rhode Island pages 679-682.
• Luminescence of Organic Materials: Metal Induced Quenching and Its Revival
  Vi-En Choong, Yongsup Park, Yongli Gao, Bing R. Hsieh* and Ching W. Tang**; University of Rochester, Rochester, New York 
  *Xerox Corporation, Webster, New York 
  **Eastman Kodak Co., Rochester, New York pages 683-687.
• Electroclinic Liquid Crystal Materials for Electrooptic Imaging
  J. Naciri, G. Crawford, R. Shashidhar and B. R. Ratna; Center for Bio/Molecular Science and Engineering, Naval Research Laboratory, Washington, D.C. pages 688-691.

Liquid Crystal Materials Poster Session

• Liquid Crystal Deflectors of Laser Radiation as the Display Devices Elements
  Maria Vistak, Zoriana Parashchuk, Larisa Vernikova, and Mihail Nutskovsky; Lviv Medical Institute, Lviv, Ukraine pages 692-694.

Photography: Chemical and Digital

Mary McCann
McCann Imaging

• The Evolution of the Concepts of Photographic Sensitivity
  J.W. Mitchell; Department of Physics, University of Virginia, Charlottesville, Virginia pages 695-695.
• The History of Cameras and Their Evolution in Espionage
  Thurman F. Naylor; The Naylor Collection, Brookline, MA pages 696-696.
• The Goal of Electronization of Photography Still Video System to Digital Photography System
  Shin Ohno; Image and Sound Communication Co., Sony Corporation (Japan)pages 697-700.

Digital Imaging and Processing

William M. Aitken
Polaroid Corporation

• Discoveries and Recoveries in 43 Years of Research
  Robert Gundlach; Xerox Corporation, Victor, New York pages 701-701.
• Laser Printer Retrospective
  Gary K. Starkweather; Apple Computer, Inc., Cupertino, California pages 702-702.
• The Top 10 Breakthroughs in Thermal Ink Jet Technology
  Cheryl Katen; Hewlett-Packard Company, San Diego, California pages 703-707.
• Color Image Processing: Present and Future
  Yoichi Miyake; Department of Information and Computer Sciences, Chiba University, Chiba, Japan pages 708-711.

Imaging Technologies

Vivian Walworth
Jasper Associates

• Precision Coating and the Success of Imaging Systems
  Edward D. Cohen; E. I. DuPont de Nemours and Co., Central Research & Development, Wilmington, Delaware pages 712-712.
• Digitize to Preserve: Photographic Collections Facing the Next Millennium
  Franziska Frey; Image Permanence Institute, Rochester Institute of Technology, Rochester, New York pages 713-715.
• Diffuse Illumination as a Default Assumption for Shape- from-Shading in the Absence of Shadows
  Christopher W. Tyler; Smith-Kettlewell Eye Research Institute, San Francisco California pages 716-721.
• Reflective Liquid Crystal Displays: The Next Major Paradigm Shift in Display Technology
  Gregory P. Crawford; Brown University, Providence, Rhode Island pages 722-723.